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Invited Speakers  Invited Speakers Y. Abe
Mitsubishi Chemical Group Science and Technology Research Center, Japan
Organic Depth Profiling by Cluster Ion Sputter
Z. J. Ding
University of Science and Technology of China, P. R. China
Depth Distribution Functions of Secondary Electron Production and Emission
S. Hajati
1. University of Southern Denmark, Denmark
2. Yasouj University, Iran
Non-Destructive Depth Profiling by XPS Peak Shape Analysis
H. Itoh
Konica Minolta Technology Center, Japan
Depth Profiling Analysis of Organic Materials by using ToF-SIMS and Gradient Shaving Preparation
H. Iwai
National Institute for Materials Science, Japan
Recent Status of Thin Film Analysis by XPS
A. Jablonski
Polish Academy of Sciences, Poland
The Backscattering Factor for Systems with Non-uniform In-depth Profile
H. J. Kang
Chungbuk National University, Korea
Ion Beam Sputtering for High Resolution Depth Profiling
K. J. Kim
Korea Research Institute of Standards and Science, Korea
Sputter Depth Profiling by SIMS; Calibration of SIMS Depth Scale Using Multi-layer Reference Materials
F. Liu
Chinese Academy of Sciences, P. R. China
Applications of XPS on Nanoscale material research
K. Nakajima
Kyoto University, Japan
Combination of High-Resolution RBS and Angle-Resolved XPS: Accurate Depth Profiling of Chemical States
T. Ogiwara
National Institute for Materials Science, Japan
Auger Depth Profiling Analysis Using an Inclined Holder
M. Suzuki
ULVAC-PHI, Japan
Brief History and Current Activity in ISO/TC201/SC4 for Depth Profiling
H. Tohma
Nissan Arc, Japan
Study of SiO powder by X-ray Photoelectron Spectroscopy Analysis
H. Yoshikawa
National Institute for Materials Science, Japan
Evaluation of Depth Distribution Function for AR-XPS using Synchrotron Radiation Hard X-ray
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