Proceedings of PSA-01 (International Symposium on Practical Surface Analysis, November 19-21, 2001, Nara, Japan)
Preface
K. Yoshihara・・・・・・・・・・・・273
Organization
・・・・・・・・・・・・・274
Keynote Lecture
Quantitative AES and XPS: Tests of Theory Using AES and XPS Databases with REELS Background SubtractionM. P. Seah, I. S. Gilmore, and S. J. Spencer・・・・275
Data Analysis and Processing
Determination of Inelastic Mean Free Path of High Energy Electrons from Shape Analysis of K-Auger and K-conversion Spectra Emitted from Thin FilmsL. Köver, S. Tougaard, J. Tóth, D. Varga, O. Dragoun, A. Kovalík, and M. Ryšavý・・・・281
Experimental Determination of Electron Inelastic Mean Free Paths in Silver, Gold, Copper and Silicon from Electron Elastic Peak Intensity Ratios
S. Tanuma, S. Ichimura, K. Goto, and T. Kimura・・・・285
Automatic Background Estimation of Spectra
Y. Nagatsuka, M. Otsuki, Y. Nagasawa, and Y. Furukawa・・・・291
Optimization of XPS Inelastic Background using Tougaard’s Formula - Recent Progress
M. Jo・・・・295
Restoration of Loss Function in Very Difficult Case - From Poor Resolution Spectrum
M. Jo・・・・302
Determination of the Depth Scale in Sputter Depth Profiling (The Sputtered Depth in Depth Profiling)
S. Hofmann and J. Y. Wang・・・・306
Analysis of Auger Depth Profiles by Logistic Function
T. Ogiwara, A. Takano, M. Suzuki, and S. Tanuma・・・・310
Application of Self-Organising Maps (SOM) to Chemical Spectra Analysis
H. Tokutaka, K. Obu-Cann, K. Fujimura, K. Yoshihara, and Metal Materials Group of SASJ・・・・315
Database
The NIST Electron Effective-Attenuation-Length DatabaseC. J. Powell and A. Jablonski・・・・322
New Instrumentations and Techniques
Fermi Level Movements at the Transition Metal/GaN InterfaceJ. M. Seo, J. H. Kim, and H. J. Kang・・・・326
Laboratory XPS Imaging: Improved Procedures and Data Analysis
K. Artyushkova, A. Ferryman, J. Farrar, and J. E. Fulghum・・・・332
Grazing Incidence X-Ray Photoelectron Spectroscopy: A Method to Study Gate Dielectric Films on Si
T. Jach and E. Landree・・・・339
In-situ Work Function Measurement of Molecular Beam Epitaxy Film Surface Using RHEED-Beam Excited Secondary Electron Peaks
H.Nonaka, T. Shimizu, K. Arai, A. Kurokawa, and S. Ichimura・・・・344
Reference Auger Electron Spectra with Work Function Corrected
Y. Z. Jiang, W. Y. Li, K. Goto, and R. Shimizu・・・・348
Influence of Ion Beam Position Shift on the Depth Profiling in AES
J. Xu, N. Fukumoto, Y. Azuma, and I. Kojima・・・・353
X-Ray Wave Guide and its Possible Application to Surface Analysis; X-Ray Traveling Waves
J.
Kawai, S. Harada, and P. Karimov・・・・356
Surface Spectroscopy Utilizing Field Electron Emission from Thermal-field Treated Tips in STM
M. Tomitori, M. Hirade, Y. Suganuma, and T. Arai・・・・359
Charging Effects in Gold Nanoclusters Grown on Octanedithiol Self-assembled Monolayers Observed by Scanning Tunneling Microscopy and X-ray Photoelectron Spectroscopy
D. Fujita, K. Ishige, and T. Ohgi・・・・365
Management of Extreme Trace Analysis of Metal on Silicon Wafer Surfaces
S. Kushibe and N. Yabumoto・・・・370
The Development of the Angle Resolved XPS Equipment at SPring-8 BL15XU
H.
Yoshikawa, Y. Kita, K. Watanabe, A. Tanaka, M. Kimura, A. Nisawa, V. A. Mihai, M. Kitamura, N. Yagi, M. Okui, M. Taguchi, R. Oiwa, and S. Fukushima・・・・374
Metals
Practical Characterization of Surface and Interface Phenomena in Iron and SteelS. Suzuki・・・・378
Nickel Enrichment at the Interface between Oxide Layer and Matrix in Iron-NickelAlloys
S. Suzuki and K. Yanagihara・・・・384
Redistribution Behavior of Trace Elements during Internal Oxidation of an Fe-6mol% Si Alloy at 1123 K
K. Yanagihara, S. Suzuki, and S. Yamazaki・・・・388
Surface Segregation of Substrate Al in the Cr/Al/Al System
S. Bera, T. T. Lay, and M. Yoshitake・・・・392
Practical Aspects of Charging Phenomena in XPS as Demonstrated in Oxidized-Al Films on Al and Al Alloys
D. R.
Baer, C. F. Windisch Jr., M. H. Engelhard, and K. R. Zavadil・・・・396
Surface Analysis of Impact Compressed Cu-Ni Multilayer
T. Une, J. W. Lee, M. Nakamura, and T. Tanaka・・・・404
Boron and Oxygen Redistribution during Silicidation Process of Titanium-Silicon System
K. Yanagihara and S. Hayashi・・・・408
Evaluation of Solder Composition by Surface Analysis
A. Koizumi, Y. Miyajima, Y. Morita, H. Katagiri, M. Iwai, Y. Yamazaki, and S. Kobayashi・・・・412
Cross-sectional analysis of the Interface between Sn-Ag-Cu solder alloy and Substrate by using angle lapping Method
N. Ishikawa, T. Kimura, T. Sugisaki, and S. Tanuma・・・・416
XPS Analysis and Solder Wettability of Sn-Cu and Sn-Pb Platings Accelerated by Various Methods
N. Suzuki, M. Hirose, Y. Haraguchi, Y. Tadokoro, and H. Moriuchi・・・・420
Electronic Materials
Study of Capacitor Material for Advanced Memory Devices using Surface AnalysisM. Nakamura and M. Nakabayashi・・・・424
Interdiffusion at Ge/Si Interfaces Studied with AES Depth Profiling
V. Kesler and S. Hofmann・・・・428
Chemical Shift at Interface for Silicides
Y. Yamauchi, M. Yoshitake, and SERD project group of SASJ・・・・432
Atomic Scale Interface Analysis with MEIS for Nano-Electronics Technology
D. W. Moon, H. I. Lee, H. K. Kim, K. J. Kim, and H. J. Kang・・・・436
A Practical Procedure for Surface Protection of a Bulk Specimen in the Air
K. Yanagiuchi and S. Tsuchida・・・・442
Inorganic Materials
Surface Analysis of Oxide Glass Surfaces : the Relationship between Atomic Charges and XPS Chemical ShiftsM. Gautier-Soyer, H. Cruguel, M. J. Guittet, O. Kerjan, F. Bart, and L. Bois・・・・446
Effects of Charging and Crystallinity on Sputter-Etching Rate of Al2O3 Single Crystal
S. Araki, H. Tohma, and SERD Project Group of Surface Analysis Society of Japan・・・・451
Changes in the Chemical State and Composition of the Surface of Iron Oxides due to Argon Ion Sputtering
S. Suzuki, K. Sugiyama, and Y. Waseda・・・・455
Alternation of Ti 2p XPS Spectrum for TiO2 by Ar Ion Bombardment
S. Hashimoto, A. Murata, T. Sakurada, and A. Tanaka・・・・459
Organic Materials
Photoelectron Spectroscopy Study of the Electronic Structures of Al/MgF2/tris-(8-hydroxyquinoline) aluminum InterfacesY. Park, J. Lee, S. K. Lee, and D. Y. Kim・・・・463
Theoretical X-ray Photoelectron and Auger Electron Spectra of Polymers by Density Functional Theory Approaches Using Model Molecules
T. Otsuka, S. Koizumi, K. Endo and D. P. Chong・・・・467
Surface Damage of PVC Polymers during XPS Analysis
K. Takaoka, S. Koizumi, S. Maeda, C. Bureau, K. Endo, K. Hyodo and H. Miura・・・・471
Analysis of XPS and AES of Carbon Allotrope (Diamond, Graphite, C60) by DFT Calculations using the Model Molecules
S. Koizumi, T. Otsuka, K. Endo and T. Morohashi・・・・477
Author Index
・・・・・・・・・・・・484