Preface
Developments in Quantitative Surface Analysis ProceduresSven Tougaard・・・・1
Lecture: Practical Surface Analysis
Signal Generation in XPS and AES (in Japanese)Masatoshi Jo・・・・3
Calibration of Energy Scale and Intensity Scale (in Japanese)
Michiko Yoshitake・・・・17
Handling of Specimens (in Japanese)
Hajime Tohma・・・・27
Charge-up compensation (in Japanese)
Hideo Iwai・・・・37
Reduction of sample damage (in Japanese)
Kaoru Miura・・・・49
Analysis of depth profiling (in Japanese)
Toshiya Ogiwara・・・・58
Data analysis (in Japanese)
Kazuhiro Takahasi・・・・68
Analysis of XPS spectra (in Japanese)
Masayasu Nagoshi・・・・78
Analysis of AES spectra (in Japanese)
Makoto Nakamura・・・・91
Database and Commom Data Processing System (in Japanese)
Yutaka Takeuchi・・・・104
Notice of follow-up
Katsuaki Yanagiuchi・・・・113
Papers
Characterization for SiO2/Si Multilayer by X-ray Photoelectron Spectroscopy (in Japanese)Toshiyuki Ohama, Tomomi Harada, Takeshi Tanaka, and Keishi Kawabata・・・・116
Non-destructive Depth Profile Analysis of SiO2/Si Layer by High-energy XPS (in Japanese)
Hiroyuki Yamamoto and Yuji Baba・・・・122
Salon in SASJ
Report from PSA'99 (in Japanese)・・・・・・・・・・・・128