Preface
Quantitative AnalysisJohn T.Grant・・・・1
Lecture: Practical Surface Analysis
Imaging with Auger ElectronsM.Prutton・・・・2
Sputter Depth Profiling of Thin Films by AES,XPS and ToF-SIMS
Hans Jorg Mathieu・・・・6
Applicat10ns of the MRI-model in Sputter Depth profiling
S.Hofmann・・・・9
Review
Specimen Preparation and Mounting for Surface Analysis (in Japanese)Kazuhiko Dohmae・・・・14
Quantitative Surface Analysis by X-ray Photoelectron Spectroscopy (in Japanese)
S. Tanuma・・・・20
Papers
Improvement of Transmission Calibration of PHI Spectrometer using Background 0ptimizationMasatoshi Jo・・・・35
Depth profiling of Te-Ge-Sb 0ptical Disk, Depth Profiling of te-Ge-Sb 0ptical Disk
Atsuko Kojima, Toshiyuki Matsunaga, and Noboru Yamada・・・・42
Simulated Data of Valence XPS of Polymers by M0 Calculations Using the Model MoleculesII Cl-, COO-, F-, N-, S-, and Si-Containing Polymers
Kazunaka Endo and Delano P.Chong・・・・50
High Accuracy Determination of the Density of Pt Thin Films by Comparative Measurements of X-ray Reflectivity and Gravimetry
Isao Kojima, Shilling Wei,Boquan Li,and Toshiyuki Fujimoto・・・・70
Technical Reports
Surface Cleaning for nip, InAs and InSb Wafers (in Japanese)H. Nonoue, A. Kojima, and M. Nakamura・・・・77
Technical Documents
Data Input Manual for Spectral Database with COMPRO Version 5 (in Japanese)A. Kojima・・・・86
Topical Reports
What is the Problem in AES - Energy calibration in an absolute Auger analyzer -Keisuke Goto・・・・94
Current Status of Standardization for Energy Calibration in XPS (in Japanese)
T. Usuki・・・・95
An Introduction for Reference Level Problem (in Japanese)
Atsushi Nisawa・・・・97
Electrochemical Potential and Work Function (in Japanese)
Hidekazu Touhara・・・・102
Vacuum Level from the Viewpoint of Physics (in Japanese)
Kenji Shiraishi・・・・104
XI Format-Converter an ASCII Fi1e Conversion program
B.V.Crist・・・・106
Comment on ”Background of the Sensitivity Factors of Auger Electron and X-ray Photoelectron Spectroscopies” (JSA Vol. 3, No. 3 pp. 699-703 by A. Tanaka and N. Suzuki) (in Japanese)
Shingo Ichimura・・・・108
Replies and Discussions to the ”Comments on ’Background of the Sensitivity Factors of Auger Electron and X-ray Photoelectron Spectroscopies' " (in Japanese)
A. Tanaka・・・・111
Book Review
“Introduction of Surface Analysis” (in Japanese) (K. Yoshihara and M. Yoshitake, Shokabo, 1997) (in Japanese)S. Tanuma・・・・116
Minutes of Working groups
10th meeting of Organic Materials Group・・・・・・・・・・・・118
10th meeting of Inorganic Materials Group
・・・・・・・・・・・・119
10th meeting of Metal Materials Group
・・・・・・・・・・・・120
10th meeting of Electronic Materials Group
・・・・・・・・・・・・121
6th meeting of Database Commitee
・・・・・・・・・・・・123
Journal of Surface Analysis: Guide for Authors
・・・・・・・・・・・・126
Journal of Surface Analysis: Cumulative Author Index/Contents of Volume 3
・・・・・・・・・・・・134