Special Issue on Quantitative Surface Chemical Analysis in honor of Kazuhiro Yoshihara
Preface
The Founder of Practical Surface AnalysisD. Fujita, S. Tanuma and M. Suzuki・・・・135
Review
Recent Advances to Establish XPS as an Accurate Metrology ToolM. P. Seah・・・・136
The MRI-Model in Sputter Depth Profiling : Capabilities, Limitations and Recent Progress
S. Hofmann and J. Y. Wang・・・・142
What nano-physical properties can be determined by analysis of elastic peak accompanied by its inelastic background tail in XPS and AES spectra ?
S. Hajati and S. Tougaard・・・・148
Spectroscopy of electrons excited from solids using high energy photons and electrons
L. Köver・・・・156
Paper
Quantitative Analysis of AlxGa1-xN Thin Films by XPSJ. T. Grant・・・・166
A predictive formula for the electron stopping power
A. Jablonski, S. Tanuma and C. J. Powell・・・・170
Perfluorosilanized Aluminum Oxide Surfaces
E. Hoque, J. A. DeRose, P. Hoffmann and H. J. Mathieu・・・・178
Interface potential measurement with electron spectroscopic method
M. Yoshitake and W. Songt・・・・185
Electron Beam Effects on AES Depth Profiling of SiO2 Thin Film on Si (001) : a Factor Analysis Study
D. Fujita, K. Onishi, T. Yakabe and K. Yoshihara・・・・190
Construction of a data base for secondary electron emission by a novel approach based on Monte Carlo simulations
T. Iyasu and R. Shimizu・・・・200
Essay
My Footprints on the Field of Practical Surface AnalysisK. Yoshihara・・・・206
Postscript
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