Proceedings of PSA 04
Preface
Dear ColleaguesDae Won Moon・・・・69
Paper
Accurate Thickness Measurements in Thin Films with Surface AnalysisM. P. Seah・・・・70
Testing of Lateral Resolution in the Nanometre Range Using the BAM-L002 - Certified Reference Material: Application to ToF-SIMS IV and NanoESCA Instruments
M. Senoner, Th. Wirth, W. E. S. Unger, M. Escher, N. Weber, D. Funnemann and B. Krömker・・・・78
Development and Applications of Multiple Delta-Layer Reference Materials for Semiconductor Analysis
K. J. Kim, D. W. Moon, P. Chi and D. Simons・・・・83
New Developments in Data for Auger Electron Spectroscopy and X-ray Photoelectron Spectroscopy
C. J. Powell, A. Jablonski, F. Salvat, S. Tanuma, and D. R. Penn・・・・88
Recent Developments and Applications in AES and XPS
Daisuke Sakai, Noriaki Sanada, John S. Hammond and Hideo Iwai・・・・97
Challenges in Applying Surface Analysis Methods to Nanoparticles and Nanostructured Materials
D.R. Baer, M. H. Engelhard, D. J. Gaspar, D. W. Matson, K. H. Pecher, J. R. Williams, and C. M. Wang・・・・101
The Absolute AES is Coming; Work Functions and Transmission of CMA
W.Y. Li, A.A. Iburahim, K. Goto and R. Shimizu・・・・109
Practical Technique for Restraining Differential Charging in X-ray Photoelectron Spectroscopy: Os Coating
Y. Mori・・・・113
Lateral Resolution of EDX Analysis with Ultra Low Acceleration Voltage SEM
Tsuguo Sakurada, Satoshi Hashimoto, Yasuo Tsuchiya, Shigeaki Tachibana, Minoru Suzuki and Kenichi Shimizu・・・・118
High-Energy Resolution Microcalorimeter EDS System for Electron Beam Excitation
Keiichi Tanaka, Atsushi Nagata, Norio Sasayama, Masanori Ikeda, Akikazu Odawara, Satoshi Nakayama and Kazuo Chinone・・・・122
Simulation and Quantitative Interpretation of Electron Spectra for Surface Analysis
W. S.M. Werner・・・・127
Surface Excitation Correction for Elastic Peak Electron Pectroscopy (EPES)
G. Gergely, M. Menyhard, S. Gurban, A. Jablonski・・・・140
Intrinsic Excitations in Deep Core Auger and Photoelectron Spectra of Ge and Si
L. Kövér, S. Egri, I. Cserny, Z. Berényi, J. Tóth, J. Végh, D. Varga・・・・146
Simulation of Thermal Decomposition for Polymer Molecules
Tomonori Ida, Hiroaki Sugimoto, Daisuke Matsumoto, Kazunaka Endo・・・・153
Quantitative Measurement of Arsenic Implant Dose by SIMS
D.S. Simons, P.H. Chi and K.J. Kim・・・・157
Depth Resolution Parameters and Sputtering Rates Extracted from Amorphous and Crystalline Silicon Materials for SIMS Shallow Depth Profiling
Mitsuhiro Tomita, Hiroki Tanaka, Mitsuo Koike and Shiro Takeno・・・・161
SIMS Depth Profiling of Characteristic Thin Surface Layers Formed in Titanium by Mechanical Abrasion and Annealing
Shigeru Suzuki, Toshio Sato, Akira Kurokawa and Shingo Ichimura・・・・166
The Shave-off Depth Profiling by the Nano-Beam SIMS
M.Toi, A.Maekawa, T.Yamamoto, B.Tomiyasu, T.Sakamoto, M.Owari, M.Nojima and Y.Nihei・・・・170
A Comparative Study of GDOES, SIMS and XPS Depth Profilingof Thin Layers on Metallic Materials
Shigeru Suzuki and Kazutoshi Kakita・・・・174
Problems Caused by Ion Sputtering for the Mesh-Replica Method and Caution in Measuring Sputtered Surface Profiles
M. Suzuki, M. Kaise, T. Kimura, and S. Tanuma・・・・178
The Degradation of Perfluorinated Organic Thin Film During XPS Measurement
Masahide Sato, Hidetoshi Watanabe, Takeshi Furusawa, Noboru Suzuki・・・・183
Evaluation of Damage Cross Sections by Au Cluster Ion Bombardment
Y. Abe・・・・188
Plasma Modification of Biomaterials Controlled by Surface Analysis
H.J. Mathieu, X. Gao, D. J. Balazs・・・・193
Study of 3D Micro-Scale Analysis of Freeze-Non-Dried Biotissue
YuJing Liu, M. Nojima, T. Sakamoto, M. Owari・・・・200
Evaluation of Proteins Immobilized on Glass Substrates of Biosensor with TOF-SIMS
Satoka Aoyagi, Masahiro Kudo・・・・204
Coverage Estimation of Silane Functionalized Perfluoropolyether Layer by using Time of Flight Secondary Ion Mass Spectrometry, Atomic Force Microscopy and Ion Scattering Spectroscopy
S.Ichikawa, R.Kuze, T.Shimizu and H.Shimaoka・・・・208
X-Ray Photoelectron and Carbon Kα Emission Spectral Analysis of Polymers by DFT Calculations using QM/MM Method
Yuichi Kimura, Toshiyuki Hiroi, Shingo Shimada, Motohiro Mizuno, Kazunaka Endo, Ernst Z. Kurmaev, A. Moewes・・・・213
Effect of Annealing on the Bonding Structure and Dielectric Properties of a-C:F Thin Films
Chang Young Kim, Ho Jeong Ko, Duk Soo Kim and Chi Kyu Choi・・・・218
Secondary Ion Mass Spectrometry of Isotope-Labeled Iron Corrosion Products
Shigeru Suzuki, Sang-Koo Kwon and Yoshio Waseda・・・・223
Analysis of Tritium in Ti-3H Thin Film Target by ERD-TOF and (d, α) Reaction
Kim Gi Dong, Kim Joon Kon, Hong Wan, Woo Hyung Joo, Eum Chul Hun, and Choi Han Woo・・・・227
Adsorption of (CH3)2S on c(10×2)Ag/Cu(100) Studied by S K-edge NEXAFS and XPS
Shinya Yagi, Yoshihiro Nakano, Eiji Ikenaga, Ghalif Kutluk, Saydul A. Sardar, Jamal. A. Syed, Kenichiro Tanaka, Eiji Hashimoto, Kazuo Soda and Masaki Taniguchi・・・・232
Adsorption Behavior of (CH3)2S on Rh(100) Studied by Sulfur K-Edge NEXAFS and XPS
T. Nomoto, S. Yagi, G. Kutluk, K. Soda, E. Hashimoto, and M. Taniguchi・・・・238
Theoretical Analysis of Photocatalytic Interaction Between TiO2 Cluster and H2O
Yuichi Kimura, Wataru Motozaki, Kazunaka Endo and Kazuchiyo Takaoka・・・・244
Analysis of UV-Visible Absorption Spectra for Quartz and Topaz in Silicate Minerals by MO Calculations Using the Cluster Model Molecules
H. Goto, A. Niwa, D. C. Greenidge, N. Kato, T. Ida, M. Mizuno, K. Endo and T. Tada・・・・249
Temperature Dependence of Band Alignment in Ultra-thin HfO2/Si Interface
Hua Jin, S. K. Oh, H. J. Kang, S. W. Lee, Y. S. Lee, M. H. Cho・・・・254
Invetigation of Hydrophobic Properties of PSII-modified EVOH, LLDPE, and PET Films
Yeonhee Lee, Seunghee Han, and Youngsoo Kim・・・・258
Study of Hafnium Related Oxide Thin Films for Advanced Gate Dielectrics Using Surface Analysis
Makoto Nakamura, Akihiro Tanaka, David G. Watson, Masaru Shimomura, Yasuo Fukuda, ShiQin Xiao and Kazuto Ikeda・・・・263
Si Kα Chemical Shift and Charge State of Si in Metal Silicides
Hideshi ISHII, Shuji MATSUO, Shouichi SUGATA, Pavel KARIMOV, Hisanobu WAKITA, Koki TANAKA and Jun KAWAI・・・・267
Quantification of Surface Effects in Electron Spectroscopy
K. Salma, Z.J. Ding, H.M. Li, Z.M. Zhang・・・・272